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Physics / Ellipsometry / Radiometry / Neutron scattering / Neutron reflectometry / X-ray reflectivity / Reflectivity / Optics / Scientific method / Spectroscopy


MULTI-TECHNIQUE STUDIES OF ULTRATHIN SiO2 FILMS[removed]
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Document Date: 2000-02-29 13:06:50


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Company

ULTRATHIN SiO2 FILMS / C. A. Richter N. V. / /

Event

Product Issues / /

Facility

Neutron Research National Institute of Standards and Technology Gaithersburg / J. R. Ehrstein Semiconductor Electronics Division National Institute of Standards and Technology Gaithersburg / /

Organization

Institute of Standards and Technology Gaithersburg / /

Person

Si Log (Reflectivity) / /

Position

nm model / indicating similar interface widths / /

Product

sample / Photon Energy / /

Technology

frequency modulation / integrated circuit / X-ray / simulation / /

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