Effect of initial resist thickness on residual layer thickness of nanoimprinted structures Hae-Jeong Lee, Hyun Wook Ro, Christopher L. Soles,a兲 Ronald L. Jones, Eric K. Lin, and Wen-li Wu NIST Polymers Division, 100 Bu

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Date: 2009-04-16 16:33:36		Effect of initial resist thickness on residual layer thickness of nanoimprinted structures Hae-Jeong Lee, Hyun Wook Ro, Christopher L. Soles,a兲 Ronald L. Jones, Eric K. Lin, and Wen-li Wu NIST Polymers Division, 100 Bu Add to Reading List Source URL: www.nanonex.com Download Document from Source Website File Size: 288,62 KB Share Document on Facebook