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Contamination Specification for Dimensional Metrology SEMs András E. Vladár, K. P. Purushotham and Michael T. Postek National Institute of Standards and Technology (NIST), 100 Bureau Dr. Stop 8212, Gaithersburg, MD 208
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Document Date: 2015-04-02 18:11:20


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File Size: 2,01 MB

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Vladar A. E. / /

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USD / /

Facility

National Institute of Standards and Technology / Michael T. Postek National Institute of Standards and Technology / /

IndustryTerm

acid piranha solution / low energy case / hydrogen peroxide solution / turbo-molecular and oil-free fore pumps / secondary electron imaging / piranha solution / acidic piranha solution / low-energy oxygen plasma cleaning process / industrial applications / mild gas jet / imaging / wet chemical cleaning / resolution imaging parameters / Low-energy oxygen plasma / energy / /

Organization

National Institute of Standards and Technology / /

Person

Christopher J. Raymond / Michael T. Postek / J. Raymond Proc / John A. Allgair / Dual Beam II II / Neal T. Sullivan / /

Position

1H HH pm / /

ProvinceOrState

Maryland / /

Technology

semiconductor / process control / integrated circuits / /

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http /

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