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22 nanometer / 16 nanometer / Ultraviolet / Extreme ultraviolet / 32 nanometer / Multiple patterning / 11 nanometer / Angular resolution / Next-generation lithography / Electromagnetic radiation / Extreme ultraviolet lithography / Photolithography


Microsoft PowerPoint - BEUV Dublin1.3ho .ppt
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Document Date: 2010-12-02 11:22:35

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File Size: 547,08 KB

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low-k1 imaging enhancements / /

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Vadim Banine / Andrei Yakunin / Denis Glushkov / /

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radiation / Flash / lithography / SRAM / /

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