32 nanometer

Results: 25



#Item
1HC19Panel - What's Next Beyond CMOS? Shahidi_HOT_Rump V3.ppt

HC19Panel - What's Next Beyond CMOS? Shahidi_HOT_Rump V3.ppt

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Source URL: www.hotchips.org

Language: English - Date: 2013-07-27 23:59:50
2Microsoft PowerPoint - HC18.410.S4T1.Virtex5, the Next Generation 65nm FPGA.ppt

Microsoft PowerPoint - HC18.410.S4T1.Virtex5, the Next Generation 65nm FPGA.ppt

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Source URL: www.hotchips.org

Language: English - Date: 2013-07-27 23:52:08
3Production Technologies for Mass-production  Pioneering Development of Immersion Lithography UCHIYAMA Takayuki Abstract NEC Electronics has pioneered the development of the immersion lithography technology in order to de

Production Technologies for Mass-production Pioneering Development of Immersion Lithography UCHIYAMA Takayuki Abstract NEC Electronics has pioneered the development of the immersion lithography technology in order to de

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Source URL: www.nec.com

Language: English - Date: 2012-09-11 09:28:37
4Circuit Analysis Tools (CAT) Developing tools that keep pace with Moore’s Law scaling Program Manager: Dr. Carl McCants; E-mail: [removed] Microelectronics designs are advancing faster than our capacity to

Circuit Analysis Tools (CAT) Developing tools that keep pace with Moore’s Law scaling Program Manager: Dr. Carl McCants; E-mail: [removed] Microelectronics designs are advancing faster than our capacity to

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Source URL: www.iarpa.gov

Language: English - Date: 2014-11-12 08:33:33
5Atmos. Chem. Phys., 13, 531–545, 2013 www.atmos-chem-phys.net[removed]doi:[removed]acp[removed] © Author(s[removed]CC Attribution 3.0 License.  Atmospheric

Atmos. Chem. Phys., 13, 531–545, 2013 www.atmos-chem-phys.net[removed]doi:[removed]acp[removed] © Author(s[removed]CC Attribution 3.0 License. Atmospheric

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Source URL: www.atmos-chem-phys.net

Language: English - Date: 2013-01-17 21:04:45
6Climate Leaders –Intel Update

Climate Leaders –Intel Update

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Source URL: epa.gov

Language: English - Date: 2010-03-31 16:57:46
7Lithius AutoCal Demo Report

Lithius AutoCal Demo Report

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Source URL: www.eecs.berkeley.edu

Language: English - Date: 2009-02-18 17:13:16
8PROJECT RESULT  Lithography T406: Extreme UV consortium for imaging technology (ExCITe)

PROJECT RESULT Lithography T406: Extreme UV consortium for imaging technology (ExCITe)

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Source URL: www.catrene.org

Language: English - Date: 2009-03-25 10:39:59
9PROJECT RESULT  IC technology integration  T206: CMOS SOI for low power logic and

PROJECT RESULT IC technology integration T206: CMOS SOI for low power logic and

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Source URL: www.catrene.org

Language: English - Date: 2009-03-25 10:39:38
10Project result  CT301 I Extreme UV lithography entry point technology development [EXEPT] The extreme ultra-violet (EUV)

Project result CT301 I Extreme UV lithography entry point technology development [EXEPT] The extreme ultra-violet (EUV)

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Source URL: www.catrene.org

Language: English - Date: 2013-09-04 08:46:13