energy positions / lower binding energy indicating / oxygen gas pressure dependence / metalorganic chemical vapor deposition / chemical states / oxygen gas partial pressures / oxygen gas pressures / energy / /
Organization
University of Tokyo / Tokyo / Synchrotron Radiation Research Organization / Department of Applied Chemistry / /
Photon Factory Activity Report 2008 #26 Part BSurface and Interface 2C/2008S2-003 Effects of thermal annealing on charge density and N chemical states in HfSiON films studied by photoemission spectroscopy