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Electronics / 32 nanometer / 45 nanometer / Extreme ultraviolet / Intel / 90 nanometer / 65 nanometer / Extreme ultraviolet lithography / Electronic engineering / Technology


EUV Lithography at Insertion and Beyond
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Document Date: 2012-07-01 20:01:42

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File Size: 3,86 MB

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Company

Manufacturing Group Intel Corporation / Intel / HP / /

Currency

pence / /

IndustryTerm

technology generation / /

Organization

Pitch Division / IDF / /

Person

Kenny Toh / Robert Bristol / Mark Phillips / Yan Borodovsky / /

Position

Senior Fellow Director / Director / Advanced Lithography Portland Technology Development Technology / /

ProgrammingLanguage

NIL / /

Technology

Lithography / Last 10 Years 22nm SRAM Test Chip / /

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