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Plasma / Physics / Science / Chemistry / Nanotechnology / Ashing


Cryogenic approaches to low-damage patterning of porous low-k films Francesca Iacopi1,*, Sven Stauss1, Kazuo Terashima1, Mikhail R.Baklanov2 1Dept.of
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Document Date: 2012-05-24 09:18:35


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File Size: 1,81 MB

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City

Leuven / /

Country

Japan / Australia / /

/

Facility

The University of Tokyo / Griffith University / /

IndustryTerm

gas phase diffusion / plasma processing / porous media / /

Organization

Griffith University / University of Tokyo / Graduate School / Queensland Micro and Nanotechnology Centre / /

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