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25nm Immersion Lithography at a 193nm Wavelength Bruce W. Smith, Yongfa Fan, Michael Slocum, Lena Zavyalova Rochester Institute of Technology, Microelectronic Engineering Department, 82 Lomb Memorial Drive, Rochester, Ne
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Document Date: 2012-06-07 11:55:05
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File Size: 3,25 MB
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25nm Immersion Lithography at a 193nm Wavelength Bruce W. Smith, Yongfa Fan, Michael Slocum, Lena Zavyalova Rochester Institute of Technology, Microelectronic Engineering Department, 82 Lomb Memorial Drive, Rochester, Ne