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Nitrides / Superhard materials / Semiconductor device fabrication / Titanium aluminium nitride / PLATIT / Cathodic arc deposition / Cemented carbide / Physical vapor deposition / Titanium nitride / Chemistry / Coatings / Thin film deposition


Investigation of TiAlN alloys
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Document Date: 2007-10-03 15:51:48


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City

Roskilde / Grenchen / Tallinn / /

Company

Korhonen A. S. / Philips / Estonia 4 Platit AG / Critical Load Thin Solid Films / Cathodic Arc Ion Plating Method Thin Solid Films / Avesta Sheffield Inc. / /

Country

Switzerland / Denmark / /

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Facility

Institute of Materials Technology / Tallinn Technical University / /

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IndustryTerm

metal specimens / stainless steel / untreated steel substrates / metal substrates / hard metal / actual industrial tools / /

MusicGroup

X-ray / /

Organization

Institute of Materials Technology / Centre of Materials Research / Critical Normal Force / Estonian State Science Foundation / Tallinn Technical University / /

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Position

author / VP / Corresponding author / /

Technology

radiation / X-ray / CVD / /

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