Back to Results
First PageMeta Content
Thin film deposition / Materials science / Epitaxy / Silicon carbide / Chemical vapor deposition / Doping / Thin film / N-type semiconductor / Semiconductor device / Chemistry / Semiconductor device fabrication / Manufacturing


Principal Research Results Establishment of the Base Technology of Large-Capacitance SiC Semiconductor −Development of High Growth Rate and Large-Diameter Epitaxy Technique− Background
Add to Reading List

Document Date: 2009-03-04 02:31:11


Open Document

File Size: 225,68 KB

Share Result on Facebook

Company

Related Wide Bandgap Semiconductors / Large-Capacitance SiC Semiconductor / /

Facility

CVD reactor / /

IndustryTerm

gas inlet / chemical process / power electronics devices / power devices / semiconductor devices / source gas concentration / long carrier lifetime / /

Organization

Japan Society of Applied Physics / /

Person

Masahiko Ito / /

Position

Researcher / /

Product

SiC / /

Technology

semiconductor / radiation / Base Technology / Technology of Large-Capacitance SiC Semiconductor / CVD / semiconductor devices / Chemical Vapor Deposition / /

SocialTag