![Technology / Electronics manufacturing / Chemical bonding / Wafer bonding / Microelectromechanical systems / Deep reactive-ion etching / Wafer / Through-silicon via / EV Group / Semiconductor device fabrication / Materials science / Microtechnology Technology / Electronics manufacturing / Chemical bonding / Wafer bonding / Microelectromechanical systems / Deep reactive-ion etching / Wafer / Through-silicon via / EV Group / Semiconductor device fabrication / Materials science / Microtechnology](https://www.pdfsearch.io/img/ede15e39162f66d4fe702a715465c54c.jpg)
| Document Date: 2013-01-18 04:24:22 Open Document File Size: 113,76 KBShare Result on Facebook
City Berlin / / / Facility Fraunhofer Institute / / IndustryTerm metal filling / important key technologies / image sensor systems / carrier oppermann@izm.fraunhofer.de / carrier wafer using gold-thin solder / manufacturing / thin wafer backside processing / / Organization European Union / Fraunhofer Institute for Reliability / / Person Kai Zoschke / / / Technology important key technologies / MEMS / required technologies / / URL www.izm.fraunhofer.de / /
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