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Computational lithography
Results: 16

#	Item
1	Control of the Receding Meniscus in Immersion Lithography H. Burnett, T. Shedd,∗ G. Nellis, M. El-Morsi, and R. Engelstad Computational Mechanics Center, University of Wisconsin, 1513 University Ave., Madison, WI 53706 Add to Reading List Source URL: sel.me.wisc.edu Language: English - Date: 2005-08-10 21:14:02
2	FRAUNHOFER INSTI TUTE FOR I NTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB General Description Dr.LiTHO is a comprehensive simulation environment for photolithography developed at Fraunhofer IISB. Its main focus is on de Add to Reading List Source URL: www.iisb.fraunhofer.de Language: English - Date: 2015-06-08 13:42:32 Photolithography Semiconductor device fabrication Photoresist Resist Interference lithography Fraunhofer Society Ultraviolet Simulation Computational lithography Materials science Microtechnology Chemistry
3	Photronics Relies on Synopsys for Photomask Manufacturing Solutions “We selected Synopsys to be our primary EDA partner because they are the only EDA company that delivers the complete range of design solutions we need Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:34:10 CATS Photomask Numerical Technologies Computational lithography Electronic engineering Hillsboro Oregon Synopsys
4	Datasheet Sentaurus Lithography Predictive Modeling of Lithographic Processes Overview Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:34:17 Computational lithography Extreme ultraviolet lithography Multiple patterning Photolithography Immersion lithography Optical proximity correction Resist Lithography Electron beam lithography Microtechnology Materials science Technology
5	PDF Document Add to Reading List Source URL: spie.org Language: English - Date: 2015-04-13 10:58:59 Extreme ultraviolet lithography Extreme ultraviolet Microtechnology Immersion lithography Computational lithography Interference lithography Photoresist Photomask College of Nanoscale Science and Engineering Materials science Electromagnetic radiation Technology
6	Y–Y E A • • • • • Add to Reading List Source URL: spie.org Language: English - Date: 2015-04-13 09:40:24 SPIE Semiconductor device fabrication Extreme ultraviolet lithography Computational lithography Immersion lithography Nanoimprint lithography Applied Materials Synopsys Lithography Materials science Microtechnology Technology
7	Datasheet Sentaurus Lithography Predictive Modeling of Lithographic Processes Overview Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:34:17 Computational lithography Extreme ultraviolet lithography Multiple patterning Photolithography Immersion lithography Optical proximity correction Resist Lithography Electron beam lithography Microtechnology Materials science Technology
8	COMPUTATIONAL MODELING OF DIRECT PRINT MICROLITHOGRAPHY Add to Reading List Source URL: www.troian.caltech.edu Language: English - Date: 2009-09-16 18:45:40 Surface chemistry Science Condensed matter physics Nanotechnology Intermolecular forces Hydrophobe Self-assembled monolayer Contact angle Lithography Chemistry Physical chemistry Fluid mechanics
9	2014 Exhibition Guide www.spie.org/al Moving Technology to Market™ Exhibition Add to Reading List Source URL: spie.org Language: English - Date: 2014-11-20 04:22:54 SPIE Extreme ultraviolet lithography Photolithography Computational lithography Photomask Multiple patterning Lithography Microelectromechanical systems Synopsys Materials science Technology Microtechnology
10	Datasheet Sentaurus Lithography Predictive Modeling of Lithographic Processes Overview Add to Reading List Source URL: www.synopsys.com Language: English - Date: 2014-11-07 14:34:17 Computational lithography Extreme ultraviolet lithography Multiple patterning Photolithography Immersion lithography Optical proximity correction Lithography Resist Electron beam lithography Materials science Technology Microtechnology

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