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Semiconductor device fabrication / Ion source / Coatings / Plasma physics / Plasma / Physical vapor deposition / Inductively coupled plasma / Electron cyclotron resonance / Chemical vapor deposition / Physics / Chemistry / Plasma processing


INTRODUCTION TO THE HYBRID PLASMA EQUIPMENT MODEL Prof. Mark J. Kushner University of Illinois Department of Electrical and Computer Engineering
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Document Date: 1999-01-16 19:02:04


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File Size: 377,53 KB

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Company

Discharge Physics Group / /

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Facility

University of Illinois / ODP04 COMPUTATIONAL OPTICAL AND DISCHARGE PHYSICS GROUP University of Illinois / QUARTZ SHOWERHEAD NOZZLE FEED COIL FEED FOCUS RING PUMP PORT / Prof. Mark J. Kushner University of Illinois Department / W ODPM05 UNIVERSITY OF ILLINOIS OPTICAL AND DISCHARGE PHYSICS COMPUTATIONAL OPTICAL AND DISCHARGE PHYSICS GROUP Contact Information / V UNIVERSITY OF ILLINOIS OPTICAL AND DISCHARGE PHYSICS Example / INTRODUCTION TO THE HYBRID PLASMA EQUIPMENT MODEL Prof. Mark J. Kushner University of Illinois Department / UNIVERSITY OF ILLINOIS OPTICAL AND DISCHARGE PHYSICS Example / ODPM01 Pump Port / University of Illinois Optical / /

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IndustryTerm

plasma etching systems / plasma processing reactors / semiconductor chip / plasma equipment / ionized metal fluxes / plasma tools / /

Organization

University of Illinois Optical / University of Illinois / University of Illinois Department of Electrical and Computer Engineering / ODPM05 UNIVERSITY OF ILLINOIS OPTICAL AND DISCHARGE PHYSICS COMPUTATIONAL OPTICAL AND DISCHARGE PHYSICS GROUP Contact Information / V UNIVERSITY OF ILLINOIS OPTICAL AND DISCHARGE PHYSICS Example / /

Person

Ion Flux / Ion Etchers / /

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Position

CONTROLLER / /

ProvinceOrState

Illinois / /

Technology

semiconductor / laser / MICROWAVE / SIMULATION / Lasers / 3-d / Chemical Vapor Deposition / /

URL

http /

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