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Power electronics / Semiconductor devices / MOSFET / Field-effect transistor / Gate oxide / Threshold voltage / Silicon carbide / Insulated gate bipolar transistor / Polysilicon depletion effect / Electrical engineering / Electronic engineering / Technology


4H-SiC MOSFETs with High Channel Mobility by P-Doped Gate Oxide Assistant Prof. Hiroshi YANO (NAIST) 1. 4H-SiC MOSFET DC Transmission
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Document Date: 2012-11-19 02:09:11


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File Size: 238,72 KB

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Company

UPS / /

Country

United States / /

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IndustryTerm

ultra-low power loss devices / /

NaturalFeature

Low channel / Typical channel / /

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Position

P-Doped Gate Oxide Assistant / /

URL

http /

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