Pulsed Electron Deposition ¾ Suitable for a wide range of materials, including multicomponent metal-oxides, complex alloys, and novel polymers ¾ Non-equilibrium extraction of target material (ablation) facilitates sto

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Date: 2013-01-04 14:36:08 Materials science Manufacturing Pulsed laser deposition Thin film Evaporation Laser Electron Epitaxy Electron beam physical vapor deposition Thin film deposition Semiconductor device fabrication Physics		Pulsed Electron Deposition ¾ Suitable for a wide range of materials, including multicomponent metal-oxides, complex alloys, and novel polymers ¾ Non-equilibrium extraction of target material (ablation) facilitates sto Add to Reading List Source URL: www.neocera.com Download Document from Source Website File Size: 353,95 KB Share Document on Facebook

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