Pulsed Electron Deposition ¾ Suitable for a wide range of materials, including multicomponent metal-oxides, complex alloys, and novel polymers ¾ Non-equilibrium extraction of target material (ablation) facilitates sto - Electron beam physical vapor deposition - Document - PDFSEARCH.IO

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	Pulsed Electron Deposition ¾ Suitable for a wide range of materials, including multicomponent metal-oxides, complex alloys, and novel polymers ¾ Non-equilibrium extraction of target material (ablation) facilitates sto Add to Reading List Document Date: 2013-01-04 14:36:08 Open Document File Size: 353,95 KB Share Result on Facebook City Beltsville / / Company Neocera Inc. / / / / IndustryTerm energy variation / pulse energy / preinstalled software / pulsed energy deposition techniques / high volume manufacturing / multicomponent metal-oxides / e-beam / electron deposition systems / / / Position controller / representative / / ProgrammingLanguage J / / ProvinceOrState Maryland / / Technology radiation / Laser / semiconductors / x-ray / / URL www.neocera.com / / SocialTag Materials science Manufacturing Pulsed laser deposition Thin film Evaporation Laser Electron Epitaxy Electron beam physical vapor deposition Thin film deposition

Pulsed Electron Deposition ¾ Suitable for a wide range of materials, including multicomponent metal-oxides, complex alloys, and novel polymers ¾ Non-equilibrium extraction of target material (ablation) facilitates stoAdd to Reading List