Secondary Ion Mass Spectroscopy SIMS Surface Photoabsorption SPA / Oxide Thin Films / Leskelä Laboratory / Situ Studies Antti Rahtu Laboratory / /
Country
Finland / /
Event
Diplomatic Relations / /
Facility
University of Helsinki / ALD reactor / In Situ Studies Antti Rahtu Laboratory of Inorganic Chemistry Department / Applied Chemistry University of Strathclyde U.K. / Prof. Markku Leskelä Laboratory of Inorganic Chemistry Department / Chemistry University of Helsinki Finland Reviewers Prof. Lauri Niinistö Laboratory / Science University of Helsinki Finland / Analytical Chemistry Helsinki University of Technology Finland Mr. Jaan Aarik Institute of Physics University / /
IndustryTerm
microelectronic devices / gas phases / gas phase deposition techniques / metal alkoxide / metal halide process / metal ratio / microelectronic applications / gas phase / /
Movie
The Name of the Rose / /
Organization
Faculty of Science / Pure and Applied Chemistry University of Strathclyde U.K. / Michael L. Hitchman Department of Pure / Chemistry University of Helsinki Finland Reviewers / Growth and In Situ Studies Antti Rahtu Laboratory of Inorganic Chemistry Department of Chemistry Faculty / Lauri Niinistö Laboratory of Inorganic / Physics University of Tartu Estonia Opponent / Helsinki University of Technology Finland / Markku Leskelä Laboratory of Inorganic Chemistry Department / University of Helsinki / Jaan Aarik Institute / Science University / Department of Chemistry / /
Person
Michael L. Hitchman / Umberto Eco / Crystal Microbalance / Ion Scattering / /
Position
Author / General / /
Technology
semiconductor / X-ray / Dielectric / Spectroscopy / random access / ALE / CVD / pdf / Chemical Vapor Deposition / integrated circuit / /
väikkäri-4_0Niinisto_Aarik_1_3d.PDF