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Semiconductor device fabrication / Thin film deposition / Electron beam / Focused ion beam / Failure analysis / Electron beam induced current / Electron microscope / Scanning electron microscope / Electron backscatter diffraction / Scientific method / Science / Electron microscopy
Date: 2014-05-20 04:29:23
Semiconductor device fabrication
Thin film deposition
Electron beam
Focused ion beam
Failure analysis
Electron beam induced current
Electron microscope
Scanning electron microscope
Electron backscatter diffraction
Scientific method
Science
Electron microscopy

FRAUNHOFER CAM IS A COMPETENCE CENTER FOR MICROSTRUCTURE DIAGNOSTICS A N D M AT E R I A L C H A R A C T E R I Z AT I O N WITHIN FRAUNHOFER IWM IN HALLE FRAUNHOFER CENTER

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