![Semiconductor device fabrication / Thin film deposition / Electron beam / Focused ion beam / Failure analysis / Electron beam induced current / Electron microscope / Scanning electron microscope / Electron backscatter diffraction / Scientific method / Science / Electron microscopy Semiconductor device fabrication / Thin film deposition / Electron beam / Focused ion beam / Failure analysis / Electron beam induced current / Electron microscope / Scanning electron microscope / Electron backscatter diffraction / Scientific method / Science / Electron microscopy](https://www.pdfsearch.io/img/d971bad6fa0fe1fa2b9dde463860cf9d.jpg) Date: 2014-05-20 04:29:23Semiconductor device fabrication Thin film deposition Electron beam Focused ion beam Failure analysis Electron beam induced current Electron microscope Scanning electron microscope Electron backscatter diffraction Scientific method Science Electron microscopy | | FRAUNHOFER CAM IS A COMPETENCE CENTER FOR MICROSTRUCTURE DIAGNOSTICS A N D M AT E R I A L C H A R A C T E R I Z AT I O N WITHIN FRAUNHOFER IWM IN HALLE FRAUNHOFER CENTERAdd to Reading ListSource URL: www.iwm.fraunhofer.deDownload Document from Source Website File Size: 1,26 MBShare Document on Facebook
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