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Semiconductor device fabrication / Thin film deposition / Electron beam / Focused ion beam / Failure analysis / Electron beam induced current / Electron microscope / Scanning electron microscope / Electron backscatter diffraction / Scientific method / Science / Electron microscopy


FRAUNHOFER CAM IS A COMPETENCE CENTER FOR MICROSTRUCTURE DIAGNOSTICS A N D M AT E R I A L C H A R A C T E R I Z AT I O N WITHIN FRAUNHOFER IWM IN HALLE FRAUNHOFER CENTER
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Document Date: 2014-05-20 04:29:23

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City

Si / /

Company

Fraunhofer CAM / FIB / /

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IndustryTerm

Chemical etching / elemental manufacturing yield / electronics / dopant contrast imaging / mechanical access imaging systems / system innovative technologies / semiconductor technologies / decapsulation equipment / automotive electronics / diagnostic tool / microsystem technologies / /

Organization

WITHIN FRAUNHOFER IWM IN HALLE FRAUNHOFER CENTER FOR APPLIED MICROSTRUCTURE DIAGNOSTICS CAM FRAUNHOFER CAM MAJOR APPLICATIONS SEMICONDUCTOR Fraunhofer CAM / /

Person

Frank Altmann / CAM FRAUNHOFER CAM MAJOR / /

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Technology

semiconductor / microsystem technologies / Optoelectronics / Thermography system / MEMS / semiconductor technologies / simulation / integrated circuits / CMP / CAD / /

URL

www.cam.fraunhofer.de / /

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