![Materials science / Nucleation / Grain growth / Epitaxy / Surface diffusion / Polycrystalline silicon / Chemical vapor deposition / Pulsed laser deposition / Chemistry / Semiconductor device fabrication / Thin film deposition Materials science / Nucleation / Grain growth / Epitaxy / Surface diffusion / Polycrystalline silicon / Chemical vapor deposition / Pulsed laser deposition / Chemistry / Semiconductor device fabrication / Thin film deposition](https://www.pdfsearch.io/img/44c24c1e020ba96bdb0f940fc02b5a2f.jpg) Date: 2007-07-14 18:58:39Materials science Nucleation Grain growth Epitaxy Surface diffusion Polycrystalline silicon Chemical vapor deposition Pulsed laser deposition Chemistry Semiconductor device fabrication Thin film deposition | | Thin Solid Films[removed]–70 Quantitative modelling of nucleation kinetics in experiments for poly-Si growth on SiO2 by hot wire chemical vapor deposition Maribeth S. Mason*, Jason K. Holt, Harry A. Atwater ThomaAdd to Reading ListSource URL: daedalus.caltech.eduDownload Document from Source Website File Size: 524,03 KBShare Document on Facebook
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