Pulsed bias effect on roughness of TiO2:Nb films deposited by grid assisted magnetron sputtering

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Coatings Semiconductor device fabrication Solar cells Sputter deposition Titanium dioxide Thin film Sputtering High Power Impulse Magnetron Sputtering Chemistry Materials science Thin film deposition		Pulsed bias effect on roughness of TiO2:Nb films deposited by grid assisted magnetron sputtering Add to Reading List Source URL: www.appliedadhesionscience.com Download Document from Source Website File Size: 1,60 MB Share Document on Facebook

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