![Semiconductor device fabrication / Thin film deposition / Plasma physics / Coatings / Materials science / Sputter deposition / Sputtering / Plasma / Mass spectrometry / Chemistry / Physics / Science Semiconductor device fabrication / Thin film deposition / Plasma physics / Coatings / Materials science / Sputter deposition / Sputtering / Plasma / Mass spectrometry / Chemistry / Physics / Science](https://www.pdfsearch.io/img/6a3b44a37ba9bb9aefb4343eefdb1bee.jpg) Date: 2014-12-11 20:17:14Semiconductor device fabrication Thin film deposition Plasma physics Coatings Materials science Sputter deposition Sputtering Plasma Mass spectrometry Chemistry Physics Science | | Physics of High Power Impulse Magnetron Sputtering André Anders1*, Joakim Andersson1, David Horwat1, and Arutiun Ehiasarian2 1 Lawrence Berkeley National Laboratory, University of California, 1 Cyclotron Road, Berkeley,Add to Reading ListSource URL: eetd.lbl.govDownload Document from Source Website File Size: 411,54 KBShare Document on Facebook
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