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Semiconductor device fabrication / Thin film deposition / Plasma physics / Coatings / Materials science / Sputter deposition / Sputtering / Plasma / Mass spectrometry / Chemistry / Physics / Science
Date: 2014-12-11 20:17:14
Semiconductor device fabrication
Thin film deposition
Plasma physics
Coatings
Materials science
Sputter deposition
Sputtering
Plasma
Mass spectrometry
Chemistry
Physics
Science

Physics of High Power Impulse Magnetron Sputtering André Anders1*, Joakim Andersson1, David Horwat1, and Arutiun Ehiasarian2 1 Lawrence Berkeley National Laboratory, University of California, 1 Cyclotron Road, Berkeley,

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