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Mass spectrometry / Coatings / Materials science / Thin film deposition / Astrophysics / Sputter deposition / Sputtering / Plasma / Ion / Chemistry / Physics / Science


The occurrence of Ti4+ ions in a high power impulse magnetron sputtering plasma
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Document Date: 2014-12-11 20:16:40

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File Size: 234,46 KB

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City

Sheffield / Berkeley / /

Company

HIDEN Ltd. / Renewable Energy / Advanced Energy Inc. / Thin Solid Films / Joakim Andersson Lawrence Berkeley National Laboratory / Melec GmbH / United Kingdom André Anders Lawrence Berkeley National Laboratory / /

Country

Sweden / /

Facility

Building Technology / Sheffield Hallam University / Engineering Research Institute / /

IndustryTerm

metal / cumulative ionization energy / metal neutrals / optimum energy setting / titanium energy distribution / gas discharge / i.e. high potential energy / kinetic energy / metal ion species / energy setting / potential energy / potential energy enabling high yield / excitation energy / oil-free cryopump / high energy / potential and kinetic energy / energy-resolving mass spectrometer / metal ion content / metal ions / ionization energy / sputter gas / appreciable metal ion content / metal ion etching / ion energy / energy / /

Organization

office of Building Technology / Arutiun P. Ehiasarian Materials and Engineering Research Institute / U.S. Department of Energy / Sheffield Hallam University / /

Position

Assistant Secretary / /

ProvinceOrState

Pennsylvania / California / /

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