![Microtechnology / Cleaning / Supercritical fluid / Etching / Dry cleaning / Low-k dielectric / Wet cleaning / Resist / Matter / Semiconductor device fabrication / Materials science / Technology Microtechnology / Cleaning / Supercritical fluid / Etching / Dry cleaning / Low-k dielectric / Wet cleaning / Resist / Matter / Semiconductor device fabrication / Materials science / Technology](https://www.pdfsearch.io/img/ac3e84c69fd667bffe8ae4444494bb73.jpg)
| Document Date: 2012-02-08 11:03:30 Open Document File Size: 217,32 KBShare Result on Facebook
City Phillipsburg / / Company Porous MSQ Films / Mallinckrodt Baker Inc. / / Currency IDR / / / IndustryTerm metal / nm chemical processes / wafer-cleaning solutions / Chemical reactions / technology generations / high-energy / use low-energy processes / supercritical fluid technology / nanoelectronic devices / basic chemical / conducthigh-energy plasma / dielectric proprietary chemical / metal ion removal / technology constant / chemicals / restoration protocols / / Movie Restoration / / Person Ralph Pascoe / Craig Topping / / Position organic-solvent-based conductor / / ProvinceOrState New Jersey / / PublishedMedium Semiconductor International / / Technology supercritical fluid technology / Alternative technologies / laser / lithography / restoration protocols / RP 3=Restoration protocol / dielectric / / URL www.mallbaker.com / www.semiconductor.net / /
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