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Low-k dielectric
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1	86 Technology focus: GaN HEMTs First application of low-cost deposition of titanium dioxide for GaN MOS-HEMT Ultrasonic spray pyrolysis deposition has been used to create devices Add to Reading List Source URL: www.semiconductor-today.com Language: English - Date: 2015-01-23 09:10:57 Semiconductor devices Transistor High electron mobility transistor High-k dielectric Gallium nitride Aluminium gallium nitride Transconductance Chemistry Electronics Nitrides
2	AMDp2 - 5 High-Performance and Low-Temperature-Compatible Solid Phase Crystallized Polycrystalline Silicon Thin Film Transistors Using Thermal Oxide Buffered Aluminum Oxide as Gate Dielectric Add to Reading List Source URL: www.pskl.ust.hk Language: English - Date: 2014-10-10 03:11:48 Electronics Semiconductor device fabrication Electronic engineering Transistors High-k dielectric Thin-film transistor Equivalent oxide thickness Chemical vapor deposition Thermal oxidation Chemistry Semiconductors Technology
3	2001 IEEE 7th International Conference on Solid Dielectrics, June 25-29,2001, Eindhoven, the Netherlands 187 NOVEL THIN FILM POLYMER FOAMING TECHNIQUE FOR LOW AND ULTRA LOW-K DIELECTRICS B. Krause, G.H. Koops, N.F.A. va Add to Reading List Source URL: doc.utwente.nl Language: English - Date: 2011-08-28 10:53:45 Materials science Electricity Physical quantities Thermoplastics Organic polymers Low-k dielectric Polyimide Relative permittivity Microcellular plastic Chemistry Physics Electromagnetism
4	nfos CALL FOR PAPERS 19th Conference on “Insulating Films on Semiconductors” 29 June-2 July 2015, Udine, Italy Add to Reading List Source URL: infos2015.uniud.it Language: English - Date: 2014-12-18 11:11:53 Electronics IMEC Low-k dielectric Dielectric Nanowire Materials science Physics Electromagnetism
5	INFOS2015_1st_Announcement_2.1 Add to Reading List Source URL: infos2015.uniud.it Language: English - Date: 2014-12-18 11:11:53 IMEC Low-k dielectric Dielectric Nanowire Insulator Physics Electromagnetism Materials science
6	NANOCHIP Technology Journal EXTENDING COPPER INTERCONNECT Add to Reading List Source URL: www.appliedmaterials.com Language: English - Date: 2014-01-26 17:00:01 Materials science Thin film deposition MOSFET Chemical vapor deposition Low-k dielectric Silicide Titanium nitride Metal gate Copper interconnect Chemistry Semiconductor device fabrication Technology
7	728 IEEE ELECTRON DEVICE LETTERS, VOL. 31, NO. 7, JULY 2010 Characterization of Selectively Deposited Cobalt Capping Layers: Selectivity and Add to Reading List Source URL: www.appliedmaterials.com Language: English - Date: 2014-05-12 14:27:49 Chemical vapor deposition Coatings Plasma processing Vacuum Chemical engineering Low-k dielectric Chemistry Thin film deposition Semiconductor device fabrication
8	2998 Macromolecules 2006, 39, [removed]SANS and XRR Porosimetry of a Polyphenylene Low-k Dielectric Michael S. Silverstein* Add to Reading List Source URL: www.ncnr.nist.gov Language: English - Date: 2006-04-13 10:24:47 Surface chemistry Porous media Scattering Materials science Porosimetry Adsorption Desorption Porosity Kelvin equation Chemistry Physical chemistry Physics
9	six0512low.qxd[removed]:50 PM Add to Reading List Source URL: www.sgw.com Language: English - Date: 2012-02-08 11:03:30 Microtechnology Cleaning Supercritical fluid Etching Dry cleaning Low-k dielectric Wet cleaning Resist Matter Semiconductor device fabrication Materials science Technology
10	INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS[removed]EDITION Add to Reading List Source URL: public.itrs.net Language: English - Date: 2014-03-27 14:06:28 International Technology Roadmap for Semiconductors Integrated circuit Electronic engineering 16 nanometer 180 nanometer 90 nanometer 22 nanometer Microtechnology Low-k dielectric Materials science