![Thin film deposition / Vacuum / Measuring instruments / Plasma processing / Residual gas analyzer / Mass spectrometry / Physical vapor deposition / Thin film / Ultra-high vacuum / Chemistry / Technology / Spectrometers Thin film deposition / Vacuum / Measuring instruments / Plasma processing / Residual gas analyzer / Mass spectrometry / Physical vapor deposition / Thin film / Ultra-high vacuum / Chemistry / Technology / Spectrometers](https://www.pdfsearch.io/img/bf1cf98d557632b2d304855c7159e1fc.jpg)
| Document Date: 2012-09-18 11:05:17 Open Document File Size: 549,13 KBShare Result on Facebook
Company MKS Instruments Inc. / RGA Process Monitoring Software / Microsoft Corporation / MicroVision / / Country United States / / Facility Global Headquarters / / IndustryTerm process tool / process monitoring applications / sensor control software / high energy physics / analytical equipment / gas composition / e-diagnostics / on-line monitoring / electronics platform / real-time corrections using gauge pressure / network compatible applications / higher pressure applications / Field-proven technology / residual gas analysis / component residual gas analyzers / cluster tools / residual gas analyzers / process gas analysis / gas mixtures / user-configurable software program / process tools / electronics unit mounts / / NaturalFeature Multi-Stream Inlet / / / Position smart head / analyzer head / / Product Microsoft Corporation Portable Audio Device / / ProgrammingLanguage K / / Technology semiconductor / ethernet / operating systems / CVD / Chemical Vapor Deposition / / URL www.mksinst.com / /
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