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Thin film deposition / Semiconductor device fabrication / Oxides / Barium compounds / Reflection high-energy electron diffraction / Molecular beam epitaxy / Magnesium oxide / Pulsed laser deposition / Epitaxy / Chemistry / Matter / Ceramic materials
Date: 2007-03-30 16:10:12
Thin film deposition
Semiconductor device fabrication
Oxides
Barium compounds
Reflection high-energy electron diffraction
Molecular beam epitaxy
Magnesium oxide
Pulsed laser deposition
Epitaxy
Chemistry
Matter
Ceramic materials

doi:[removed]j.jcrysgro[removed]

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