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Thin film deposition / Semiconductor device fabrication / Oxides / Barium compounds / Reflection high-energy electron diffraction / Molecular beam epitaxy / Magnesium oxide / Pulsed laser deposition / Epitaxy / Chemistry / Matter / Ceramic materials


doi:[removed]j.jcrysgro[removed]
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Document Date: 2007-03-30 16:10:12

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File Size: 1,25 MB

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City

Si / Pasadena / /

Company

ARTICLE IN PRESS / A. Atwater Thomas J. Watson Laboratories / Ferro / Thin Solid Films / Elsevier B.V. / /

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Facility

California Institute of Technology / /

IndustryTerm

delta data using software / lm optical devices / photonic applications / metal organic chemical vapor deposition / in situ reflection high-energy electron diffraction / silicon processing / reflection high-energy electron diffraction / e-beam / tunable photonic devices / oxygen gas / monitored using reflection high-energy electron diffraction / /

Organization

Center for Science and Engineering of Materials / California Institute of Technology / ARO / NSF MRSEC Center / /

Person

Matthew J. Dicken / Kenneth Diest / Crystal Growth / D.P. Norton / /

Position

relaxed Lorentzian model for the dielectric function / Corresponding author / /

Product

Lorentzian / /

ProgrammingLanguage

ML / /

ProvinceOrState

California / /

Technology

laser / sublimation / X-ray / dielectric / radio frequency / frequency modulation / chemical vapor deposition / /

URL

www.elsevier.com/locate/jcrysgro / /

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