![Materials science / Microtechnology / Polymers / Semiconductor device fabrication / X-ray lithography / Photolithography / LIGA / SU-8 photoresist / Photoresist / Nanolithography / Beamline / Electron-beam lithography Materials science / Microtechnology / Polymers / Semiconductor device fabrication / X-ray lithography / Photolithography / LIGA / SU-8 photoresist / Photoresist / Nanolithography / Beamline / Electron-beam lithography](https://www.pdfsearch.io/img/fcb7913ee54c3d7c66f04bc0a60370b1.jpg) Date: 2012-08-02 10:08:48Materials science Microtechnology Polymers Semiconductor device fabrication X-ray lithography Photolithography LIGA SU-8 photoresist Photoresist Nanolithography Beamline Electron-beam lithography | | Soft X-Ray Lithography for High-Aspect Ratio Sub-Micrometer Structures S. Lemkea, J. Goettertb*, T. Holubeka, B. Löchela, I. Rudolpha and T. Seligera a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH, Add to Reading ListSource URL: www.camd.lsu.eduDownload Document from Source Website File Size: 609,15 KBShare Document on Facebook
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