1![Combinatorial Multilevel Mold Insert Using Micromachining and X-ray Lithography V. Singh1, J. Goettert1, O. Jinka1,2,* 1 Center for Advanced Microstructures and Devices (CAMD) Combinatorial Multilevel Mold Insert Using Micromachining and X-ray Lithography V. Singh1, J. Goettert1, O. Jinka1,2,* 1 Center for Advanced Microstructures and Devices (CAMD)](https://www.pdfsearch.io/img/804e1f53acb77d030d8e2e633b796d40.jpg) | Add to Reading ListSource URL: camd.lsu.eduLanguage: English - Date: 2012-07-31 11:19:10
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2![Microsoft Word - exposure_request_form.dot Microsoft Word - exposure_request_form.dot](https://www.pdfsearch.io/img/1854262796eed6dfbb8767f9eba54977.jpg) | Add to Reading ListSource URL: camd.lsu.eduLanguage: English - Date: 2009-01-29 10:14:22
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3![Combinatorial Multilevel Mold Insert Using Micromachining and X-ray Lithography V. Singh1, J. Goettert1, O. Jinka1,2,* 1 Center for Advanced Microstructures and Devices (CAMD) Combinatorial Multilevel Mold Insert Using Micromachining and X-ray Lithography V. Singh1, J. Goettert1, O. Jinka1,2,* 1 Center for Advanced Microstructures and Devices (CAMD)](https://www.pdfsearch.io/img/0f020819e8b3202de33a091793483009.jpg) | Add to Reading ListSource URL: www.camd.lsu.eduLanguage: English - Date: 2012-07-31 11:19:10
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4![SUEX Dry Film Resist – A new Material for High Aspect Ratio Lithography Donald W Johnsona, Jost Goettertb, Varshni Singhb and Dawit Yemaneb a b SUEX Dry Film Resist – A new Material for High Aspect Ratio Lithography Donald W Johnsona, Jost Goettertb, Varshni Singhb and Dawit Yemaneb a b](https://www.pdfsearch.io/img/9c277f052c6793463bd5f5dafa234f62.jpg) | Add to Reading ListSource URL: www.camd.lsu.eduLanguage: English - Date: 2012-08-02 10:13:02
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5![SUEX Dry Film Resist – A new Material for High Aspect Ratio Lithography Donald W Johnsona, Jost Goettertb, Varshni Singhb and Dawit Yemaneb a b SUEX Dry Film Resist – A new Material for High Aspect Ratio Lithography Donald W Johnsona, Jost Goettertb, Varshni Singhb and Dawit Yemaneb a b](https://www.pdfsearch.io/img/dcc47661268cb673e9440299d774f87e.jpg) | Add to Reading ListSource URL: camd.lsu.eduLanguage: English - Date: 2012-08-02 10:13:02
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6![Microsoft Word - exposure_request_form.dot Microsoft Word - exposure_request_form.dot](https://www.pdfsearch.io/img/9ffe952b53f170f24bc6c5dad2e517aa.jpg) | Add to Reading ListSource URL: www.camd.lsu.eduLanguage: English - Date: 2009-01-29 10:14:22
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7![FABRICATION OF 3D POLYMER-METAL NANO-COMPOSITES IN A SINGLE STEP BY TWO-PHOTON INDUCED POLYMERISATION AND METAL SALT REDUCTION Qin Hu*, Yaan Liu, Yinfeng He, Fan Zhang, Ricky Wildman, Chris Tuck and Richard Hague EPSRC C FABRICATION OF 3D POLYMER-METAL NANO-COMPOSITES IN A SINGLE STEP BY TWO-PHOTON INDUCED POLYMERISATION AND METAL SALT REDUCTION Qin Hu*, Yaan Liu, Yinfeng He, Fan Zhang, Ricky Wildman, Chris Tuck and Richard Hague EPSRC C](https://www.pdfsearch.io/img/55b313119bbd5b766884176e06d9bfe5.jpg) | Add to Reading ListSource URL: sffsymposium.engr.utexas.eduLanguage: English - Date: 2015-09-23 15:09:44
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8![Opportunities for SUEX dry laminate resist in microfluidic MEMS applications Donald W Johnsona, Jost Goettertb, Varshni Singhb and Dawit Yemaneb a b Opportunities for SUEX dry laminate resist in microfluidic MEMS applications Donald W Johnsona, Jost Goettertb, Varshni Singhb and Dawit Yemaneb a b](https://www.pdfsearch.io/img/fe32663758c9e5dbfa35b8861e286e0b.jpg) | Add to Reading ListSource URL: camd.lsu.eduLanguage: English - Date: 2012-07-20 11:49:34
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9![Negative Resists for Ultra-Tall, High Aspect Ratio Microstructures S. Lemkea, P. Goetterta, I. Rudolpha, J. Goettertb,*, B. Löchela a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH, Institute for Nanom Negative Resists for Ultra-Tall, High Aspect Ratio Microstructures S. Lemkea, P. Goetterta, I. Rudolpha, J. Goettertb,*, B. Löchela a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH, Institute for Nanom](https://www.pdfsearch.io/img/414ec6ee13c4503d5e201e689fe0086e.jpg) | Add to Reading ListSource URL: www.camd.lsu.eduLanguage: English - Date: 2012-08-02 10:05:16
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10![Soft X-Ray Lithography for High-Aspect Ratio Sub-Micrometer Structures S. Lemkea, J. Goettertb*, T. Holubeka, B. Löchela, I. Rudolpha and T. Seligera a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH, Soft X-Ray Lithography for High-Aspect Ratio Sub-Micrometer Structures S. Lemkea, J. Goettertb*, T. Holubeka, B. Löchela, I. Rudolpha and T. Seligera a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH,](https://www.pdfsearch.io/img/fcb7913ee54c3d7c66f04bc0a60370b1.jpg) | Add to Reading ListSource URL: www.camd.lsu.eduLanguage: English - Date: 2012-08-02 10:08:48
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