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Date: 2012-07-31 11:19:10Chemistry Microtechnology Materials science Polymers LIGA Semiconductor device fabrication Microelectromechanical systems Photoresist Photolithography SU-8 photoresist Poly Resist | Combinatorial Multilevel Mold Insert Using Micromachining and X-ray Lithography V. Singh1, J. Goettert1, O. Jinka1,2,* 1 Center for Advanced Microstructures and Devices (CAMD)Add to Reading ListSource URL: www.camd.lsu.eduDownload Document from Source WebsiteFile Size: 1,32 MBShare Document on Facebook |