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Technology / Manufacturing / Coatings / Atomic layer deposition / Chemical vapor deposition / High-k dielectric / Polycrystalline silicon / Atomic layer epitaxy / Titanium nitride / Thin film deposition / Chemistry / Semiconductor device fabrication


A302-medea+ (lo1[removed]:54
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Document Date: 2009-03-25 10:37:04

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Company

Philips / STMicroelectronics / /

Continent

Europe / /

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Facility

ALCVD reactor / /

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IndustryTerm

separate gas-phase precursors / cluster tool / inlaid metal / adequate device / gas flow / chemical treatment / low power devices / nm devices / conventional tor technology / conventional chemical deposition / equipment supplier / production-ready tools / metal deposition / /

Organization

Information Society / MEDEA+ Office / /

Person

Ir / Ivo J. Raaijmakers / /

/

Position

Project leader / leader / co-operative / /

PublishedMedium

the Information Society / /

Technology

semiconductor / conventional tor technology / CVD / dielectric / integrated circuit / /

URL

http /

SocialTag