<--- Back to Details
First PageDocument Content
CL2 / Technology / Semiconductor device fabrication / Microtechnology / Etching
Date: 2013-01-06 22:10:49
CL2
Technology
Semiconductor device fabrication
Microtechnology
Etching

Cr Etching at the UCSB Nanofabrication Facility Panasonic E640 ICP Etcher Panasonic E640 ICP Etcher • Multi-Purpose ICP etcher

Add to Reading List

Source URL: www.nanotech.ucsb.edu

Download Document from Source Website

File Size: 437,35 KB

Share Document on Facebook

Similar Documents

2013 a nn ua l rep o r t a nd 2014 prox y chairm an ’ s le t t er  2014

2013 a nn ua l rep o r t a nd 2014 prox y chairm an ’ s le t t er 2014

DocID: 1rsw9 - View Document

Electronic Devices on Various Substrates: Fabrication of Releasable SingleCrystal SiliconMetal Oxide FieldEffect Devices and Their Deterministic Assembly on Foreign Substrates (Adv. Funct. Mater)

Electronic Devices on Various Substrates: Fabrication of Releasable SingleCrystal SiliconMetal Oxide FieldEffect Devices and Their Deterministic Assembly on Foreign Substrates (Adv. Funct. Mater)

DocID: 1rrrV - View Document

Product Spotlight  SOL9620 Series Heraeus’ Industry Leading Pastes for Standard to Ultra LDE Wafers Heraeus has developed groundbreaking technology to improve

Product Spotlight SOL9620 Series Heraeus’ Industry Leading Pastes for Standard to Ultra LDE Wafers Heraeus has developed groundbreaking technology to improve

DocID: 1rqYm - View Document

TRTA3 – IC Design INDUSTRY Roadmapping Pascal Viaud – STE Presented by Dr. Richard Hizon September 8, 2015

TRTA3 – IC Design INDUSTRY Roadmapping Pascal Viaud – STE Presented by Dr. Richard Hizon September 8, 2015

DocID: 1rokp - View Document

www.pwc.com  The Internet of Things: The next growth engine for the semiconductor industry

www.pwc.com The Internet of Things: The next growth engine for the semiconductor industry

DocID: 1rkZi - View Document