![32 nanometer / 45 nanometer / Ultraviolet / Resist / Extreme ultraviolet lithography / Microtechnology / Materials science / Multiple patterning / Immersion lithography 32 nanometer / 45 nanometer / Ultraviolet / Resist / Extreme ultraviolet lithography / Microtechnology / Materials science / Multiple patterning / Immersion lithography](https://www.pdfsearch.io/img/45378becb6a8c7302ecd1e6172ddde8f.jpg)
| Document Date: 2006-12-05 09:53:48 Open Document File Size: 186,63 KBShare Result on Facebook
Company HP / Ambassador Hotel Hsin Chu Taiwan 3 Potential Solutions / / Continent Europe / / Country Taiwan / Japan / United States / Korea / / Currency AMD / / Person Andrew Grenville / Michael Lercel / Etch Hard Mask / Gene Fuller / / / Position co-chair / Major / chair / Ambassador / COO / / Technology Lithography / Flash / CAD / /
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