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32 nanometer / 45 nanometer / Ultraviolet / Resist / Extreme ultraviolet lithography / Microtechnology / Materials science / Multiple patterning / Immersion lithography


2006 Lithography Update Michael Lercel And the rest of the Litho TWG’s
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Document Date: 2006-12-05 09:53:48

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File Size: 186,63 KB

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Company

HP / Ambassador Hotel Hsin Chu Taiwan 3 Potential Solutions / /

Continent

Europe / /

Country

Taiwan / Japan / United States / Korea / /

Currency

AMD / /

Person

Andrew Grenville / Michael Lercel / Etch Hard Mask / Gene Fuller / /

/

Position

co-chair / Major / chair / Ambassador / COO / /

Technology

Lithography / Flash / CAD / /

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