Taming the Challenges of 20nm Custom Analog Design Custom and analog designers will lay the foundation for 20nm IC design. However, they face many challenges that arise from manufacturing complexity. The solution lies no - Multiple patterning - Document - PDFSEARCH.IO

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	Taming the Challenges of 20nm Custom/Analog Design Custom and analog designers will lay the foundation for 20nm IC design. However, they face many challenges that arise from manufacturing complexity. The solution lies no Add to Reading List Document Date: 2012-11-09 18:02:00 Open Document File Size: 1,34 MB Share Result on Facebook Company IBS / Intel / Cadence Design Systems Inc. / / Currency USD / / IndustryTerm 20nm solution / metal layer / printing / siliconproven manufacturing processes / point tools / 193nm photolithography equipment / manufacturing challenges / pre-layout sensitivity analysis tools / manufacturing complexity / given chip / individual tools / electronics industry / metal pitches / electronics / Layout tools / manufacturing / 193nm lithography equipment / Extraction tools / differentiated devices / metal layers / physical design tools / manufacturing process / / OperatingSystem OSE / / Organization US Federal Reserve / / Person Min Distance / / Position layout designer / designer / / Technology Dielectric / lithography / SRAM / simulation / given chip / photolithography / PDF / / URL www.cadence.com / / SocialTag Integrated circuits Electronic design Signoff Standard cell Integrated circuit design Application-specific integrated circuit Cadence Design Systems Multiple patterning Design rule checking Electronic engineering

Taming the Challenges of 20nm Custom/Analog Design Custom and analog designers will lay the foundation for 20nm IC design. However, they face many challenges that arise from manufacturing complexity. The solution lies noAdd to Reading List