| Document Date: 2009-03-25 10:39:59
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City Paris / / Company Sematech / SAGEM / Philips / / Continent Europe / / Country Belgium / / / Facility Paul Scherrer Institute / ASML Carl Zeiss CEA-Leti Clariant ELDIM Freescale IMEC Infineon INFM-TASC Philips Paul Scherrer Institute / / / IndustryTerm mask-based exposure tool / lithographic imaging / ure tools / alpha tool / image tools / alpha prototype tools / scatterometry key processing technology / scale manufacturing / process equipment / chemical plat / interferometric imaging facilities / imaging / projecting the image tools / / Organization Information Society / EUREKA MEDEA+ Office / European Union / Paul Scherrer Institute / / Person Peter Zandbergen / / / Position leader / co-operative / / PublishedMedium the Information Society / / Technology semiconductor / alpha / Lithography / scatterometry key processing technology / Simulation / photolithography / / URL http /
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PROJECT RESULT Lithography T406: Extreme UV consortium for imaging technology (ExCITe)