| Document Date: 2015-01-05 15:18:14
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Company Sandia National Laboratories / CNF / Nexeon Limited. / / Country Korea / Ireland / / Facility National Chiao Tung University / The State University of New York / University of South Carolina / University College Cork / / IndustryTerm metal / system-onpanel applications / electrochemical devices / oxide/metal interface / non-volatile memory applications / online version / flat panel display technology / / Organization State University of New York at Binghamton / National Chiao Tung University in Taiwan / University of South Carolina / / Person Donald Pile / Mike Kelly / / Position driver / / ProvinceOrState South Carolina / / Technology semiconductor / random access / flat panel display technology / RRAM technologies / integrated circuits / /
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T ECH HIGHLIGH T S Chloride Ion Interaction with Oxide-Covered Aluminum Leading to Pitting Corrosion Corrosion would be a much more common phenomenon were it not for the passive