IEEE ELECTRON DEVICE LETTERS, VOL. 35, NO. 8, AUGUST[removed]A Comparative Study on the Effects of Annealing on the Characteristics of Zinc Oxide Thin-Film

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Date: 2014-10-10 02:44:38 Semiconductor devices Semiconductors Thin-film transistor Zinc oxide Atomic layer deposition Annealing Active-matrix liquid crystal display Heat treating Transistor Chemistry Chemical elements Post-transition metals		IEEE ELECTRON DEVICE LETTERS, VOL. 35, NO. 8, AUGUST[removed]A Comparative Study on the Effects of Annealing on the Characteristics of Zinc Oxide Thin-Film Add to Reading List Source URL: www.pskl.ust.hk Download Document from Source Website File Size: 922,18 KB Share Document on Facebook

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