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City Ta / Tempe / Oberkochen / Brussels / / Company GLOBALFOUNDRIES Inc. / Micron Technology Inc. / Mentor Graphics Corp. / BACUS / HOYA Corp / RAVE LLC / GLOBALFOUNDRIES Inc. International / Infineon Technologies AG / Cypress Semiconductor Corp. / Intel Corp. / Nikon Precision Inc. / Shin-Etsu MicroSi Inc. / Molecular Imprints Inc. / Lawrence Berkeley National Laboratory / Carl Zeiss SMS GmbH / attPSM / Plasma-Therm LLC / Toppan Photomasks Inc. / Samsung / IBM Corporation / Dai Nippon Printing Co. Ltd. / Carl Zeiss SMT GmbH / Photronics Inc. / Linda DeLano Advertising Lara Miles BACUS Technical / / Country Netherlands / / / Event Product Issues / / Facility College of Nanoscale Science / Lawrence Berkeley National Laboratory / / / IndustryTerm Exposure tools / inverse lithography technology / mask manufacturing challenges / highNA imaging / wavefront engineering solution / internal accounting / imaging / photomask technology / technology marches / stable manufacturing processes / mask defect inspection technology / metal / lithography tools / technology void / technology generation / manufacturing / lens manufacturing / mask technology / / Organization Lawrence Berkeley National Lab / / Person Tom Faure / Lara Miles / Michael D. Archuletta / Brian Cha / Vicky Philipsen / Artur Balasinski / Oliver Kienzle / Jon Haines / Emmanuel Rausa / Brian J. Grenon / M. Warren Montgomery / Peter D. Buck / Frank E. Abboud / Steffen F. Schulze / Paul Gräupner / Wolf Staud / Mark T. Jee / Bernd Geh / John Whittey / Andreas Erdmann / Jens Timo Neumann / Pat Wight / Bryan S. Kasprowicz / Douglas J. Resnick / Thomas B. Faure / Paul W. Ackmann / Jacek K. Tyminski / Uwe F. W. Behringer / Wilhelm Maurer / Larry S. Zurbrick / / / Position Vice-President / President / Group Manager / Consultant / Secretary / Newsletter Editor / Managing Editor / illuminator / Chair / Education Chair / / Product ntd / ArF / most advanced photomasks / / ProvinceOrState Arizona / / Technology broadband / lithography / inverse lithography technology / mask technology / mask defect inspection technology / simulation / photomask technology / / URL www.SPIE.org / / SocialTag 
Photomask BACUS—The international technical group of SPIE dedicated to the advancement of photomask technology.