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2![Fabrication of phase shifting masks with TM nanoimprint lithography for PHABLE photolithography Christian Daisa, Francis Clubea,b, Harun H. Solaka, Konrad Vogelsangb, Helmut Schiftb a Eulitha AG, 5232 Villigen PSI, Switz Fabrication of phase shifting masks with TM nanoimprint lithography for PHABLE photolithography Christian Daisa, Francis Clubea,b, Harun H. Solaka, Konrad Vogelsangb, Helmut Schiftb a Eulitha AG, 5232 Villigen PSI, Switz](https://www.pdfsearch.io/img/72b275e45a808489952182b5cbf8ede0.jpg) | Add to Reading ListSource URL: www.eulitha.comLanguage: English - Date: 2014-05-05 05:15:37
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3![Datasheet PSM Create and PSM Check Alt-PSM technology for tighter control of chip performance and increased yield Product Overview Datasheet PSM Create and PSM Check Alt-PSM technology for tighter control of chip performance and increased yield Product Overview](https://www.pdfsearch.io/img/4952a4d006042c36e90042c828da8d1b.jpg) | Add to Reading ListSource URL: www.synopsys.comLanguage: English - Date: 2014-11-07 14:34:24
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4![Photomask BACUS—The international technical group of SPIE dedicated to the advancement of photomask technology. Photomask BACUS—The international technical group of SPIE dedicated to the advancement of photomask technology.](https://www.pdfsearch.io/img/e1b638a321b98014bd31f382c74a6bf9.jpg) | Add to Reading ListSource URL: spie.orgLanguage: English - Date: 2014-01-16 09:38:11
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5![Novel solution for in-die phase control under scanner equivalent optical settings for 45nm node and below Sascha Perlitz*, Ute Buttgereit*, Thomas Scherübl*, Dirk Seidel* Novel solution for in-die phase control under scanner equivalent optical settings for 45nm node and below Sascha Perlitz*, Ute Buttgereit*, Thomas Scherübl*, Dirk Seidel*](https://www.pdfsearch.io/img/ecb71ae3ba400c80e4d3cebbd2b75761.jpg) | Add to Reading ListSource URL: www.zeiss.comLanguage: English - Date: 2010-10-16 20:08:49
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