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Semiconductor device fabrication / Etching / Microtechnology / Semiconductors / Reactive-ion etching / Chemical milling / Plasma / Crystal oscillator / Lam Research / Gas / Isotropic etching


WALL STATE EFFECTS ON Cl2 POLY-SI RIE: REAL-TIME MEASUREMENTS, MECHANISMS, AND FEEDBACK CONTROL SOLUTIONS Pete I. Klimecky, Jessy W. Grizzle, and Fred L. Terry, Jr. University of Michigan/EECS Dept. , RmBeal A
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Document Date: 2016-04-25 13:15:14


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