![Ions / Matter / Semiconductor device fabrication / Plasma physics / Ion source / Plasma / Reactive-ion etching / Ion gun / Sputtering / Chemistry / Physics / Plasma processing Ions / Matter / Semiconductor device fabrication / Plasma physics / Ion source / Plasma / Reactive-ion etching / Ion gun / Sputtering / Chemistry / Physics / Plasma processing](https://www.pdfsearch.io/img/817bb4d167f3ab24721ffe8805cadf56.jpg) Date: 2010-10-02 06:51:58Ions Matter Semiconductor device fabrication Plasma physics Ion source Plasma Reactive-ion etching Ion gun Sputtering Chemistry Physics Plasma processing | | IonEtch Sputter Ion Gun, GenII The tectra IonEtch ion gun is a filamentless ion source based on a microwave plasma discharge. The IonEtch works by coupling microwave energy into a coaxial waveguide and from there via evaAdd to Reading ListSource URL: www.tectra.deDownload Document from Source Website File Size: 212,72 KBShare Document on Facebook
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