IonEtch Sputter Ion Gun, GenII The tectra IonEtch ion gun is a filamentless ion source based on a microwave plasma discharge. The IonEtch works by coupling microwave energy into a coaxial waveguide and from there via eva

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Date: 2010-10-02 06:51:58 Ions Matter Semiconductor device fabrication Plasma physics Ion source Plasma Reactive-ion etching Ion gun Sputtering Chemistry Physics Plasma processing		IonEtch Sputter Ion Gun, GenII The tectra IonEtch ion gun is a filamentless ion source based on a microwave plasma discharge. The IonEtch works by coupling microwave energy into a coaxial waveguide and from there via eva Add to Reading List Source URL: www.tectra.de Download Document from Source Website File Size: 212,72 KB Share Document on Facebook

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