![Ions / Matter / Semiconductor device fabrication / Plasma physics / Ion source / Plasma / Reactive-ion etching / Ion gun / Sputtering / Chemistry / Physics / Plasma processing Ions / Matter / Semiconductor device fabrication / Plasma physics / Ion source / Plasma / Reactive-ion etching / Ion gun / Sputtering / Chemistry / Physics / Plasma processing](https://www.pdfsearch.io/img/817bb4d167f3ab24721ffe8805cadf56.jpg)
| Document Date: 2010-10-02 06:51:58 Open Document File Size: 212,72 KBShare Result on Facebook
City Frankfurt / / Company tectra GmbH / Plasma Source Water Cooling 295 175 tectra GmbH / / / / IndustryTerm metal / microwave energy / gas dependant / hot metal electrodes / gas flow / gas load / Typical applications / energy dependant / / Person Leak Valve / Mounting Flange / / / Position mass flow controller / / Technology microwave / dielectric / / URL www.tectra.de / /
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