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Thin film deposition / Aluminium nitride / Coatings / Materials science / Sputter deposition / Sputtering / Lattice constant / Thin film / Layer / Chemistry / Semiconductor device fabrication / Nitrides


2009 June 18 ISEC Improvement of Critical Temperature of Superconducting NbN and NbTiN Thin Films Using an AlN Buffer Layer T. Shiino1, K. Todoroki1, N. D. Minh1, L. Jiang1, S. Shiba1, Y. Uzawa2, H. Maezawa3, N. Sakai1
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Document Date: 2009-06-22 00:36:45


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File Size: 1,83 MB

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Company

APL / /

Country

Japan / /

/

Facility

University of Tokyo / National Astronomical Observatory of Japan / /

Organization

University of Tokyo / Nagoya University / /

Person

Masanori Takeda / /

Region

Eastern Asia / /

Technology

X-ray / /

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