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Polymers / Technology / Semiconductor device fabrication / Photoresist / SU-8 photoresist / Spin coating / Resist / LIGA / Microelectromechanical systems / Materials science / Chemistry / Microtechnology


www.microchem.com SU[removed]
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Document Date: 2011-10-05 11:56:06

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thermal processing / final device / chemical gloves / chemical goggles / e-beam / microelectronic applications / maximum expected device / aspect ratio imaging / fresh solution / /

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Tensile Strength (Mpa) / /

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Massachusetts / /

Technology

radiation / laser / MEMS / x-ray / Dielectric / /

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www.atgc.co.jp / www.omegafilters.com / www.microchem.com / /

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