Soft X-Ray Lithography for High-Aspect Ratio Sub-Micrometer Structures S. Lemkea, J. Goettertb*, T. Holubeka, B. Löchela, I. Rudolpha and T. Seligera a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH,

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Date: 2012-08-02 10:08:48 Materials science Microtechnology Polymers Semiconductor device fabrication X-ray lithography Photolithography LIGA SU-8 photoresist Photoresist Nanolithography Beamline Electron-beam lithography		Soft X-Ray Lithography for High-Aspect Ratio Sub-Micrometer Structures S. Lemkea, J. Goettertb*, T. Holubeka, B. Löchela, I. Rudolpha and T. Seligera a Helmholtz-Zentrum Berlin (HZB) für Materialien und Energie GmbH, Add to Reading List Source URL: www.camd.lsu.edu Download Document from Source Website File Size: 609,15 KB Share Document on Facebook

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