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Nitrides / Gemstones / Thin film deposition / Aluminium nitride / Epitaxy / Silicon carbide / Etch pit density / Light-emitting diode / Crystal growth / Chemistry / Semiconductor device fabrication / Superhard materials


Bulk AlN single crystal growth on foreign substrate and preparation of free-standing native seeds
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Document Date: 2015-02-04 06:00:02


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City

Munich / Wiley / /

Company

Kubota / Nitride Semiconductors / M. S. Ramm A. S. / Ge / SiCrystal AG / C. / /

Country

Germany / Nepal / /

/

Facility

Ludwig Maximilians University / /

IndustryTerm

subsequent processing / Online Published / Online PAPER View Journal / Online Paper CrystEngComm Published / optoelectronic devices / Wet chemical etching / defect site / material processing / Online Paper tions / chemical properties / Online CrystEngComm Published / medical diagnosis devices / Online CrystEngComm Paper Published / Online Paper / technology development / air purification applications / Wet chemical etching results / chemical stability / developed technology / device applications / stage intermediate processing step / bio-agent detection systems / Defect-selective wet chemical etching / Online CrystEngComm Paper / energy / /

MusicGroup

Further / /

Organization

Bavarian Research Foundation / Ludwig Maximilians University / Royal Society of Chemistry / Department of Earth and Environmental Sciences / /

Person

B. M. Epelbaum / P. Heimann / E. Wedler / M. Feneberg / R. U. Barz / A. Winnacker / K. Hohn / M. Bickermann / J. H. Edgar / P. Gille / R. R. Sumathi / K. Thonke / O. Filip / A. Hoffmann / V / S. Nagata / B. Tautz / D. Hommel / T. Straubinger / A. M. Gigler / Mo Ka / S. Figge / B. Neuschl / /

Position

author / Acknowledgements The author / Cao / /

ProvinceOrState

New York / /

PublishedMedium

CrystEngComm / /

Technology

radiation / laser / sublimation / developed technology / X-ray / recombination / /

URL

www.rsc.org/crystengcomm / /

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