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Technology / Silicon on insulator / Thermal oxidation / Ion implantation / Wafer / Microelectromechanical systems / Silicon on sapphire / Smart Cut / Epitaxy / Semiconductor device fabrication / Materials science / Microtechnology


JOURNAL OF APPLIED PHYSICS VOLUME 93, NUMBER 9
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Document Date: 2010-12-09 11:08:13


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File Size: 1,22 MB

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Si / Peabody / /

Company

IBM / BP / Ge / RCA / /

Country

France / /

Currency

USD / /

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Facility

American Institute of Physics Downloaded / Sorin Cristoloveanu Institute of Microelectronics / Therefore building / American Institute of Physics / /

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keV ion energy / conventional equipment / bond energy peaks / surface bond energy / molecular hydrogen gas / bond surface energy / niche applications / noble gas ions / high temperature chemical vapor deposition / microphotonic chips / implantation energy leads / ion energy / micro-electro-mechanical systems / energy / metal / revolutionized electronics / gas ions / bond energy / electronic applications / actual bond energy / device processing / chemical thinning / ion implantation energy / chemical oxide / device applications / semiconductor electronics / active devices / voltage devices / /

Organization

American Institute of Physics Downloaded / American Institute of Physics / Material Research Society / Electrochemical Society / Sorin Cristoloveanu Institute of Microelectronics / Electromagnetism and Photonics / /

Person

Wafer Bonding / /

ProvinceOrState

Massachusetts / /

Technology

semiconductor / alpha / radiation / SOI technology / lithography / random access / integrated circuits / same chip / chemical vapor deposition / laser / MEMS / semiconductors / internal oxidation With SIMOX technology / Si technology / dielectric / crystallization / spectroscopy / two technologies / CVD / technology of wafer bonding / integrated circuit / /

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